JZNC-XIU01B
JZNC-XIU01B
JZNC-XIU01B
70年代初，有人用如PDP/1124这样的小型机代替原来的集中安装的模拟仪表控制。连接到中央控制室的电缆很多。如用小型机既作为控制器、同时把连接小型机的CRT又作为显示设备（即人机界面）。一台小型机需接收几千台变送器或别的传感器来的信号，完成几百个回路的运算。很显然其危险有点集中。和模拟仪表连接的电缆一样多，并且一旦小型机坏了，控制和显示都没有了。数字控制没有达到预期的目的。
后有人提出把控制和显示分开。一台计算机完成控制计算任务，另一台计算机完成显示任务。另外，一个工艺过程作为被控对象可能需要显示和控制的点很多，其中有一些还需要闭环控制或逻辑运算，工艺过程作为被控对象的各个部分会有相对独立性，可以分成若干个独立的工序，再把在计算机控制系统中独立的工序上需要显示和控制的输入、输出的点分配到数台计算机中去，把原来由一台小型机完成的运算任务由几台或几十台计算机（控制器）去完成。其中一台机器坏了不影响全局。所谓“狼群代替老虎”的战术，这就是危险分散的意思。把显示、操作、打印等管理功能集中在一起，用网络把上述完成控制和显示的两部分连成一个系统。当时有人把这种系统称为集散系统。
＆ 公司全称 ： 厦门泰尼电气有限公司
＆ 销售代表 ： 小黄
＆ 洽谈电话 ：
＆手机：
＆ 商务 QQ ： 2917675397
＆ 传真（FAX)： （请注明，01006收）
＆ 公司地址 ： 厦门市海沧区海沧街道滨湖一里7号
＆ 公司网址 ： www.xmtaini.com
Rudolph MetaPulse XCu 200mm Metrology Tool
LAM Rittal Corp. AC Distribution Unit ES5984 New
KLA-Tencor CRS 3000 300MM COMPLETE SYSTEM
Tokyo Electron ACT 8 Process Block Robotics Arm
Tokyo Electron ACT 12 Process Block Robotic Arm 200mm
Nikon Card Cage Assy. APGCi 7500 RS013-497 working
Verteq 1800 SRD Tool 1800.6 1800-6AR working 200mm
CTI-Cryogenics High Capacity Compressor 0190-07137 new
TEL ACT 12 Wafer Edge Exposure
Tokyo Electron ACT 8 Wafer Edge Exposure(WEE) Prcss Stn
Shinwa Temperature & Humidity Controller T&H-ESA-8-T-01
Rudolph Technologies MetaPulse 200X Cu Metrology Tool
Rudolph Technologies Metrology Tool MetaPulse 200X Cu
Rudolph Technologies MetaPulse 200 Metrology Tool 200mm
Tokyo Electron ACT 12 Develop Process Station Right
Tokyo Electron ACT 12 Develop Process Station Left
Tokyo Electron ACT 8 Develop Process Station Left
Novellus Concept Two Altus Wafer Chamber CVD-W complete
Shimadzu Turbopump TMP-3403LMTC rebuilt 3620-00486
AMAT XR80 Implanter 300mm Wheel and motor 0020-99685
Tokyo Electron TEL ACT 12 Chemical
TEL ACT 8 SOG Coat Process Station Right Working
Tokyo Electron TEL ACT 8 Chemical Cabinet Working
Tokyo Electron ACT 12 Coat Process Station Right
Tokyo Electron ACT 8 Coat Process Station Left
Tokyo Electron ACT 8 Coat Process Station Right
LAM Research RBM AC Distribution Unit 1B02737G01 New
Lam 150mm Chamber Assy 8 ESC 38 853-080202R150 Rfrbshd
Ebara A10S Vacuum Pump rebuilt working
ENI Spectrum 5kW RF Generator B-5002 working 0190-27361
Yaskawa Linear Servo Motor SGLFW-1ZA200A-AC11 new
KLA-Tencor Surfscan 6220 Inspection Tool AS-IS
Lam 4420 Etcher Orbital Gas Panel Assy 853-024403-100
TEL ACT 8 SOG High Temp Hot Plate (HHP)
Therma-Wave Optiprobe OP2600B Used, AS-IS
Nikon S306 Scanner Wafer Chuck 300mm SRX4P KBB21341
AMAT IECP Main AC Cabinet 0190-01661 untested
Hitachi S-9300 SEM Electron Gun Assy. untested
LAM 4420 Etcher PCB Rack 853-017305-002 Working
Ecosys Novapure Resin Tank C3-0YN-C6-K2-H2 new
Ecosys Novapure S447D Scrubber Tank C5-YY0-B5-D5-NN new
Tokyo Electron ACT 8 Chill Plate Process Station (CPL)
Leybold UL 500 dry Helium Leak Detector
ATS M-Pak Temp. Control System Chiller MP40C-DI
Lufran DI Water Heater 052-RE-480-000-U-CAB working
TEL ACT 8 WEE X-Theta Drive Assy 200mm working
TEL Fujikin Water Vapor Gen. Controller WVG-S2-Y-IB7
TEL Fujikin Water Vapor Generator WVG-S2-Y-IB4 New
TEL Fujikin Water Vapor Generator WVG-S2-Y-IB7 New
TEL ACT 12 Adhesion Process Station 12" working
Materials Research Eclipse Star Chamber Assy. A119124
MRC Eclipse Star Chamber Assy. A120946
Buckley Systems Ltd. AMAT XR80 Beam Magnet working
Hamamatsu LC5 Dual Optical EBR System
Hitachi S-9300 SEM Transfer Robot
KLA-Tencor AIT 2 Measurement Head 0021726-001
AE Apex 5513 RF Generator 5.5kW 0190-11209
ENI OEM-12B3 3 Phase RF Generator 1250W new 0190-76006
Leybold Coolvac 1500 SemiLine Cryopump working
Electroglas Horizon 4085X Wafer Prober 200mm untested
Genmark Precision Automated Transfer Robot
Edwards iQDP80 Vacuum Pump QMB250 Blower,
MRC 200mm Eclipse Magnet Assy. A120364 new
Hitachi M-308ATE PCB Cage System Controller Module
Yashibi YCC-18K-X DC Pwr Supply 5kV 500mA Hitachi M-308
AMAT XR80 Implanter Gas Interface 9090-00106 ITL
